MUSE Pipeline Reference Manual
2.1.1
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Structure to hold the parameters of the muse_wavecal recipe. More...
#include <muse_wavecal_z.h>
Data Fields | |
int | nifu |
IFU to handle. If set to 0, all IFUs are processed serially. If set to -1, all IFUs are processed in parallel. | |
const char * | overscan |
If this is "none", stop when detecting discrepant overscan levels (see ovscsigma), for "offset" it assumes that the mean overscan level represents the real offset in the bias levels of the exposures involved, and adjusts the data accordingly; for "vpoly", a polynomial is fit to the vertical overscan and subtracted from the whole quadrant. | |
const char * | ovscreject |
This influences how values are rejected when computing overscan statistics. Either no rejection at all ("none"), rejection using the DCR algorithm ("dcr"), or rejection using an iterative constant fit ("fit"). | |
double | ovscsigma |
If the deviation of mean overscan levels between a raw input image and the reference image is higher than |ovscsigma x stdev|, stop the processing. If overscan="vpoly", this is used as sigma rejection level for the iterative polynomial fit (the level comparison is then done afterwards with |100 x stdev| to guard against incompatible settings). Has no effect for overscan="offset". | |
int | ovscignore |
The number of pixels of the overscan adjacent to the data section of the CCD that are ignored when computing statistics or fits. | |
int | combine |
Type of lampwise image combination to use. | |
const char * | combine_s |
Type of lampwise image combination to use. (as string) | |
int | lampwise |
Identify and measure the arc emission lines on images separately for each lamp setup. | |
double | sigma |
Sigma level used to detect arc emission lines above the median background level in the S/N image of the central column of each slice. | |
double | dres |
The allowed range of resolutions for pattern matching (of detected arc lines to line list) in fractions relative to the expected value. | |
double | tolerance |
Tolerance for pattern matching (of detected arc lines to line list) | |
int | xorder |
Order of the polynomial for the horizontal curvature within each slice. | |
int | yorder |
Order of the polynomial used to fit the dispersion relation. | |
double | linesigma |
Sigma level for iterative rejection of deviant fits for each arc line within each slice, a negative value means to use the default (2.5). | |
int | residuals |
Create a table containing residuals of the fits to the data of all arc lines. This is useful to assess the quality of the wavelength solution in detail. | |
double | fitsigma |
Sigma level for iterative rejection of deviant datapoints during the final polynomial wavelength solution within each slice, a negative value means to use the default (3.0). | |
int | fitweighting |
Type of weighting to use in the final polynomial wavelength solution fit, using centroiding error estimate and/or scatter of each single line as estimates of its accuracy. | |
const char * | fitweighting_s |
Type of weighting to use in the final polynomial wavelength solution fit, using centroiding error estimate and/or scatter of each single line as estimates of its accuracy. (as string) | |
int | resample |
Resample the input arc images onto 2D images for a visual check using tracing and wavelength calibration solutions. Note that the image produced will show small wiggles even when the calibration was successful! | |
int | wavemap |
Create a wavelength map of the input images. | |
int | merge |
Merge output products from different IFUs into a common file. | |
Structure to hold the parameters of the muse_wavecal recipe.
This structure contains the parameters for the recipe that may be set on the command line, in the configuration, or through the environment.
Definition at line 48 of file muse_wavecal_z.h.